＜Plasma Spray Ceramic Coating＞
Alumina-, zirconia-, and titania-based ceramics have the ability to insulate and distribute heat and become a important part of microelectronic and semiconductor components. However, as the electronics industry continues to advance, improved methods have to be more flexible in these applications.
Most of the plasma spray material is powder based. However, ceramic coating can also be applied using non-powder based material. Chemical vapor deposition (CVD) and physical vapor deposition (PVD) have been developed and used for more than 20 years in the field of microelectronics. However, the process efficiency and thickness of film are both limited and restricted by these processes. Plasma spray process has relatively higher efficiency and thicker coating than CVD and PVD.
Air plasma spray (APS) process is one of the most popular plasma spray methods is the. For the ceramic coatings, material choices of plasma spray includes alumina, alumina-titania, alumina-zirconia , calcia-stabilized zirconia and yttrium-stabilized zirconia.
The plasma spray process results in a characteristic layered structure consisting of an anisotropic microstructure with lamellae and an interlamellar inside. Because of the unique microstructure, these coatings provide beneficial mechanical, thermal and chemical properties to the substrate and components.
Plus Metal Tech (PMT) provides services of protective and functional coatings, such as wear-resistant, corrosion-resistant, erosion-resistant, conductive and insulative coatings. Our thermal coating service is fully customized. Process choices depend on customer’s demands and the chosen materials. For any questions about surface treatment and enhancement, please do not hesitate to give us the message or email. We welcome for the discussion with you.